Mariam M. Hassan; Makram A. Fakhri
Volume 20, Issue 2 , April 2020, , Page 10-13
Abstract
In this paper the porous silicon (PS) was fabricated by photo electrochemical technique. Deposition of Cu2O thin film on nanocrystal-lines silicon by pulse laser was deposited by using the Tattoo removal laser, 2J and 1064 nm wavelength, and high purity Cu target at 350K in static air. Surface morphology ...
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In this paper the porous silicon (PS) was fabricated by photo electrochemical technique. Deposition of Cu2O thin film on nanocrystal-lines silicon by pulse laser was deposited by using the Tattoo removal laser, 2J and 1064 nm wavelength, and high purity Cu target at 350K in static air. Surface morphology and Photoluminescence for PS and Cu2O/Ps were investigated.
Sarah M. Taleb; Makram A. Fakhri; Salah Aldeen Adnan
Volume 20, Issue 1 , January 2020, , Page 16-23
Abstract
Lithium niobate (LiNbO3) nanostructure thin film was prepared and deposited on the substrates made of quartz by utilizing pulse laser deposition (PLD) technique. The effect of substrate temperature changing on the optical and structural properties of LiNbO3 films was investigated and studied. The chemical ...
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Lithium niobate (LiNbO3) nanostructure thin film was prepared and deposited on the substrates made of quartz by utilizing pulse laser deposition (PLD) technique. The effect of substrate temperature changing on the optical and structural properties of LiNbO3 films was investigated and studied. The chemical mixture was prepared by mixing the raw material (Li2CO3, Nb2O5) with Ethanol liquid without any further purification, at the stirrer time 3hrs without heating, then the formed material was overexposed to annealing process at 1000°C for 4hrs. LiNbO3 nanostructure thin film was characterized and analyzed by utilizing the Ultra-Violet visible (UV-vis) and X-Ray Diffraction (XRD). The UV-vis results showed that the increase in the substrate temperature to 300°C leads to decrease in the values of transmission (T%), absorption (A) and optical energy gap (Eg) and increase in the values of reflection (R%) and refractive index (n). While, the XRD results explained that the LiNbO3 structure became more pure and crystalline with increase the substrate temperature, because the intensity of the phase 2θ at the value of 34.8°, 40.06° and 48.48° correspond to (110), (113) and (024) planes disappeared at the substrate temperature 300°C. So, all presented results give a good indication to use LiNbO3 nanostructure thin film prepared at the substrate temperature 300°C for manufacturing the optical waveguide to give the best results